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Spectroscopy
VIS Raman Microspectrometer (Renishaw RM1000)
UV Raman Microspectrometer (Renishaw RM2000)
FTIR Spectrometer with Microscope (Varian Excalibur FTS-3000)
Scanning Electron Microscopy
Scanning Electron Microscope (Zeiss Supra 50VP)
with EDS (Oxford)
Environmental Scanning Electron Microscope (FEI XL30)
with EDS (EDAX) and EBSD (TSL)
Dual Beam SEM-Focused Ion Beam (FEI Strata DB235)
Transmission Electron Microscopy
Transmission Electron Microscope (JEOL JEM2100)
Focused Ion Beam
Dual Beam Focused Ion Beam - SEM (FEI Strata DB235)
X-Ray Diffraction
X-Ray Diffractometer (Siemens D500)
X-Ray Diffraction Database (JADE 7.0, MDI, Inc)
Nanoindentation
Nanoindenter XP with CSM (MTS)
Microfabrication
ICP Deep Reactive Ion Etching (STS)
E-beam Evaporator (BOC Edwards A306)
Thermal Evaporator (Thermionics VE 90)
Optical Profiler (Zygo NewView 6000)
Mask Aligner (Karl Zuss
MJB-3)
Sample Preparation
VIS Raman Microspectrometer (Renishaw RM1000)

Important Features
- Allows rapid, non-destructive chemical and structural analysis with easy or no sample preparation (solids, liquids, gases)
- Choice of 514.5 nm, 633 nm, 785 nm excitation for resonance signal enhancement and fluorescence suppression
- Research grade microscope with image capture capability
- 100 cm-1 cutoff notch filter
- High Spectral/Spatial resolution
- High sensitivity ultra-low noise RenCam CCD detector
- Powerful WiRE™ 2.0 software for intuitive operation and data manipulation
- Heating/Freezing stage
- Raman Mapping
- Raman Global Imaging with narrow-band dielectric filters
- Combined Raman/AFM capability with Nanonics MultiView 1000™ system allows direct correlation of AFM topography with Raman maps
UV Raman Microspectrometer (Renishaw RM1000)

Important Features
- Allows rapid, non-destructive chemical and structural analysis with easy or no sample preparation (solids, liquids, gases)
- Choice of 244 nm, 325 nm, 488 nm, 514.5 nm excitation for resonance signal enhancement
- Research grade microscope with image capture capability
- 100 cm-1 cutoff notch filter
- 5 cm-1 NeXT cutoff filter for study of near-excitation bands
- High Spectral/Spatial resolution
- High sensitivity ultra-low noise RenCam CCD detector
- Powerful WiRE™ 2.0 software for intuitive operation and data manipulation
- Heating/Freezing stage
FTIR Spectrometer with Microscope (Varian Excalibur FTS-3000)

Important Features
- Optical Resolution: 0.025 cm-1
- Unapodized Resolution: 0.18 cm-1
- IR Power: 40 mW at the sample
- Choice of standard DTGS and sensitive MCT detectors
- Kinetic Scan Rates: 40 spectra/second
- High-throughput optics for faster scanning
- Spectral range: < 50 cm-1 to 7500 cm-1
- UMA 600 FTIR Microscope Attachment with sensitive MCT detector
- Pellet making accessories (press and die kit) for transmission studies
- Liquid cell for transmission studies
- Diffuse Reflectance Accessory for studies of powders with no sample preparation
- Horizontal ATR Accessory for studies of highly absorbing liquids and films with easy sample preparation
- External (Specular) Reflectance Accessory for study of thin solid films and monomolecular films on liquid surfaces, variable incidence angle (8º
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85º)
- Diamond Single Reflection ATR prism for high spatial resolution studies
- Polarization measurements
Scanning Electron Microscope (Zeiss Supra 50VP) with EDS

Important Features
- Schottky Field Emission Electron Gun
- Everhart-Thornley and In-Lens Secondary and Solid State Backscatter Imaging Detectors
- High Vacuum, Variable Pressure, and High Current Modes
- Simultaneous acquisition of EDS, SE, BSD, and specimen current signals
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Oxford Energy-Dispersive X-ray Microanalysis
- IR Chamber View
Environmental SEM
(FEI XL30) with EDS and EBSD

Important Features
- Schottky Field Emission Gun
- Everhart-Thornley Secondary, Gaseuos Secondary and Solid State Backscatter Imaging
- High Vacuum, Variable Pressure, and Wet modes
- Peltier cooling stage
- EDAX Energy-Dispersive X-ray Microanalysis
- TSL Electron Back Scattered Diffraction (crystallography)
- IR Chamber View
Dual Beam Focused Ion Beam - SEM (FEI Strata DB235)
Important Features
- Site specific precision ion milling and metal deposition for 3D nanomachining, materials characterization, nanopatterning and nanofabrication.
- High brightness gallium ion beam
- Gas injection systems for platinum and insulator deposition
- Secondary electron and secondary ion imaging
- High-resolution in-lens secondary electron detector
- Omniprobe in-situ micromanipulator for preparation and manipulation (lift-out) of TEM samples
- Integrated X-ray fluorescence analyzer with a separate X-ray source providing high sensitivity for trace analysis of elemental composition (IXRF)
- Energy dispersive X-ray analysis (EDS) with e-beam
- Combined XRF-EDS spectral and mapping capabilities
Transmission Electron Microscope (JEOL JEM2100)

Important Features
- 200 keV TEM/STEM equipped with LaB6 electron gun, EDS detector for chemical analysis, bright-field STEM detector and imaging system, and high-resolution objective-lens pole piece
- Capable of < 0.2 nm high-resolution imaging, nano-beam and convergent-beam electron diffraction, and EDS compositional mapping
- Computer-controlled operation using intuitive and easy to use MS Windows™ based software
- Specimen holders include single and double tilt, high-tilt tomography, biasing, and heating
- TEM sample-preparation equipment available: ion mill, jet electropolisher, cryo-ultramicrotome, and other sample sectioning, grinding and polishing equipment
X-Ray Powder Diffractometer (Siemens D500)

Important Features
- Qualitative and quantitative crystallographic analysis
- Analysis of crystalline films and coatings
- Analysis of degree of crystallinity
- 1500 W Cu (1.54 A) fine focus tube
- Jade+ (MDI) analysis software
- Computer-based Jade MDI powder diffraction library for rapid, positive phase identifications
Nanoindenter XP (MTS)

Important Features
- Displacement resolution: <0.02 nm
- Maximum indentation depth: 500 µm
- Load application: Coil/magnet assembly
- Displacement measurement: Capacitance gauge
- Maximum load: 500 mN (50.8 gm)
- Load resolution: 50 nN (5.1 µgm)
- Contact force: <1µN
- Choice of spherical (1.4 µm, 5 µm and 17 µm radius), Berkovich and cube-corner diamond indenter tips,
scratch tip
- Programmable and fully automated indentation modes allowing testing along preselected grid or at preferred sites on the sample
- Nano CSM module allows continuous stiffness measurements
- TestWorks 4 testing software for simple experimental control and complete data analysis including hardness and modulus determination
ICP Deep Reactive Ion Etching (STS)

Important Features
- Provides high directional etch
- Features down to 0.1 um or less with aspect ratios of at least 10:1
- Gases include SF6, C4F8, CHF3, Ar, CF4, O2, CO2, He (for back side cooling)
- Controllable sidewall profile
- For Si, oxides, and polymers
- Oxide, metals, or photo resist may be used as the mask
- Etch rates up to 6 µm/min
E-beam Evaporator (BOC Edwards)

Important Features
- For physical vapor deposition process under high vacuum
- For various metal (Ag, Ag, Al , Ti , Cr, Co) thin film coating
- Handles materials with high melting points - good for lift-off
- Highest purity; vacuum better than 1x10-7 torr

Thermal Evaporator (Thermionics VE 90)
Important Features
- For thermal evaporation of thin metal films with low melting point (Au, Cr, Ag, Al)
- Two thermal stations with W boats
- Quartz crystal thickness monitor
- High vacuum 260 l/sec turbomolecular pump allows pump down within 10 min
- Digital ionization gauge for high vacuum monitoring
- Digital ammeter for the evaporation current
- Evaporation system power: 1kVA, (75 A nominal current)
- For evaporation data of metals, alloys and oxides click here
Optical Profiler (Zygo NewView 6000)

Important Features
Mask Aligner (Karl Suss MJB-3)

Important Features
- For contact exposure processes of wafers and substrates
- Manual mask aligner with 0.6 µm resolution and alignment accuracy of 0.1µm
- Wafer and substrate handling up to 4" (wafers), 4"x4" (substrates)
- 3" diameter exposure area
- Special substrate chucks for pieces, III-V materials, thick substrates, hybrids and HF components
- High precision X, Y, Q alignment stage and microscope manipulator
- 350 W mercury short-arch lamp at 365 nm and 405 nm
- High intensity optical setups for different UV-exposure wavelengths up to 90mW/cm²
Sample Preparation
Important Features
- Leica EM UC6 Cryo-ultramicrotome for precision ultrathin sectioning of soft and hard specimens
- Fishione 1010 Low-angle ion mill
- Slow-speed diamond sectioning saw and slow-speed polishing wheels
- Parallel polishers (Fischione and Gatan) and Wedge Polisher (Ted Pella)
- Dimple grinders (Fischione and Gatan)
- Ultrasonic disk cutter (Fischione)
- Optical microscopes and precision measuring tools
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