Instruments

Spectroscopy

VIS Raman Microspectrometer (Renishaw RM1000)

UV Raman Microspectrometer (Renishaw RM2000)

FTIR Spectrometer with Microscope (Varian Excalibur FTS-3000)

Scanning Electron Microscopy

Scanning Electron Microscope (Zeiss Supra 50VP) with EDS (Oxford)

Environmental Scanning Electron Microscope (FEI XL30) with EDS (EDAX) and EBSD (TSL)

Dual Beam SEM-Focused Ion Beam (FEI Strata DB235)

Transmission Electron Microscopy

Transmission Electron Microscope (JEOL JEM2100)

Focused Ion Beam

Dual Beam Focused Ion Beam - SEM (FEI Strata DB235)

X-Ray Diffraction

X-Ray Diffractometer (Siemens D500)

X-Ray Diffraction Database (JADE 7.0, MDI, Inc)

Nanoindentation

Nanoindenter XP with CSM (MTS)

Microfabrication

ICP Deep Reactive Ion Etching (STS)

E-beam Evaporator (BOC Edwards A306)

Thermal Evaporator (Thermionics VE 90)

Optical Profiler (Zygo NewView 6000)

Mask Aligner (Karl Zuss MJB-3)

Sample Preparation

 

 

VIS Raman Microspectrometer (Renishaw RM1000)

Important Features

  • Allows rapid, non-destructive chemical and structural analysis with easy or no sample preparation (solids, liquids, gases)
  • Choice of 514.5 nm, 633 nm, 785 nm excitation for resonance signal enhancement and fluorescence suppression
  • Research grade microscope with image capture capability
  • 100 cm-1 cutoff notch filter
  • High Spectral/Spatial resolution
  • High sensitivity ultra-low noise RenCam CCD detector
  • Powerful WiRE™ 2.0 software for intuitive operation and data manipulation
  • Heating/Freezing stage
  • Raman Mapping
  • Raman Global Imaging with narrow-band dielectric filters
  • Combined Raman/AFM capability with Nanonics MultiView 1000™ system allows direct correlation of AFM topography with Raman maps

 

 

UV Raman Microspectrometer (Renishaw RM1000)

Important Features

  • Allows rapid, non-destructive chemical and structural analysis with easy or no sample preparation (solids, liquids, gases)
  • Choice of 244 nm, 325 nm, 488 nm, 514.5 nm excitation for resonance signal enhancement
  • Research grade microscope with image capture capability
  • 100 cm-1 cutoff notch filter
  • 5 cm-1 NeXT cutoff filter for study of near-excitation bands
  • High Spectral/Spatial resolution
  • High sensitivity ultra-low noise RenCam CCD detector
  • Powerful WiRE™ 2.0 software for intuitive operation and data manipulation
  • Heating/Freezing stage

 

 

 

FTIR Spectrometer with Microscope (Varian Excalibur FTS-3000)

Important Features

  • Optical Resolution: 0.025 cm-1
  • Unapodized Resolution: 0.18 cm-1
  • IR Power: 40 mW at the sample
  • Choice of standard DTGS and sensitive MCT detectors
  • Kinetic Scan Rates: 40 spectra/second
  • High-throughput optics for faster scanning
  • Spectral range: < 50 cm-1 to 7500 cm-1
  • UMA 600 FTIR Microscope Attachment with sensitive MCT detector
  • Pellet making accessories (press and die kit) for transmission studies
  • Liquid cell for transmission studies
  • Diffuse Reflectance Accessory for studies of powders with no sample preparation
  • Horizontal ATR Accessory for studies of highly absorbing liquids and films with easy sample preparation
  • External (Specular) Reflectance Accessory for study of thin solid films and monomolecular films on liquid surfaces, variable incidence angle (8º - 85º)
  • Diamond Single Reflection ATR prism for high spatial resolution studies
  • Polarization measurements  

 

 

Scanning Electron Microscope (Zeiss Supra 50VP) with EDS

Important Features

  • Schottky Field Emission Electron Gun
  • Everhart-Thornley and In-Lens Secondary and Solid State Backscatter Imaging Detectors
  • High Vacuum, Variable Pressure, and High Current Modes
  • Simultaneous acquisition of EDS, SE, BSD, and specimen current signals
  • Oxford Energy-Dispersive X-ray Microanalysis
  • IR Chamber View

 

 

 

 

Environmental SEM (FEI XL30) with EDS and EBSD

Important Features

  • Schottky Field Emission Gun
  • Everhart-Thornley Secondary, Gaseuos Secondary and Solid State Backscatter Imaging
  • High Vacuum, Variable Pressure, and Wet modes
  • Peltier cooling stage
  • EDAX Energy-Dispersive X-ray Microanalysis
  • TSL Electron Back Scattered Diffraction (crystallography)
  • IR Chamber View

 

 

 

 

Dual Beam Focused Ion Beam - SEM (FEI Strata DB235)

Important Features

  • Site specific precision ion milling and metal deposition for 3D nanomachining,  materials characterization, nanopatterning and nanofabrication.
  • High brightness gallium ion beam
  • Gas injection systems for platinum and insulator deposition
  • Secondary electron and secondary ion imaging
  • High-resolution in-lens secondary electron detector
  • Omniprobe in-situ micromanipulator for preparation and manipulation (lift-out) of TEM samples
  • Integrated X-ray fluorescence analyzer with a separate X-ray source providing high sensitivity for trace analysis of elemental composition (IXRF)
  • Energy dispersive X-ray analysis (EDS) with e-beam
  • Combined XRF-EDS spectral and mapping capabilities

 

 

 

 

 

 

 

Transmission Electron Microscope (JEOL JEM2100)

Important Features

  • 200 keV TEM/STEM equipped with LaB6 electron gun, EDS detector for chemical analysis, bright-field STEM detector and imaging system, and high-resolution objective-lens pole piece
  • Capable of < 0.2 nm high-resolution imaging, nano-beam and convergent-beam electron diffraction, and EDS compositional mapping
  • Computer-controlled operation using intuitive and easy to use MS Windows™ based software
  • Specimen holders include single and double tilt, high-tilt tomography, biasing, and heating
  • TEM sample-preparation equipment available: ion mill, jet electropolisher, cryo-ultramicrotome, and other sample sectioning, grinding and polishing equipment

 

 

 

 

X-Ray Powder Diffractometer (Siemens D500)

Important Features

  • Qualitative and quantitative crystallographic analysis
  • Analysis of crystalline films and coatings
  • Analysis of degree of crystallinity
  • 1500 W Cu (1.54 A) fine focus tube
  • Jade+ (MDI) analysis software
  • Computer-based Jade MDI powder diffraction library for rapid, positive phase identifications

 

 

 

 

Nanoindenter XP (MTS)

Important Features

  • Displacement resolution: <0.02 nm
  • Maximum indentation depth: 500 µm
  • Load application: Coil/magnet assembly
  • Displacement measurement: Capacitance gauge
  • Maximum load: 500 mN (50.8 gm)
  • Load resolution: 50 nN (5.1 µgm)
  • Contact force: <1µN
  • Choice of spherical (1.4 µm, 5 µm and 17 µm radius), Berkovich and cube-corner diamond indenter tips,

scratch tip

  • Programmable and fully automated indentation modes allowing testing along preselected grid or at preferred sites on the sample
  • Nano CSM module allows continuous stiffness measurements
  • TestWorks 4 testing software for simple experimental control and complete data analysis including hardness and modulus determination

 

 

 

ICP Deep Reactive Ion Etching (STS)

Important Features

  • Provides high directional etch
  • Features down to 0.1 um or less with aspect ratios of at least 10:1
  • Gases include SF6, C4F8, CHF3, Ar, CF4, O2, CO2, He (for back side cooling)
  • Controllable sidewall profile
  • For Si, oxides, and polymers
  • Oxide, metals, or photo resist may be used as the mask
  • Etch rates up to 6 µm/min

 

 

 

 

E-beam Evaporator (BOC Edwards)

Important Features

  • For physical vapor deposition process under high vacuum
  • For various metal (Ag, Ag, Al , Ti , Cr, Co) thin film coating
  • Handles materials with high melting points - good for lift-off
  • Highest purity; vacuum better than 1x10-7 torr

 

 

 

 

 

 

 

 

Thermal Evaporator (Thermionics VE 90)

Important Features

  • For thermal evaporation of thin metal films with low melting point (Au, Cr, Ag, Al)
  • Two thermal stations with W boats
  • Quartz crystal thickness monitor
  • High vacuum 260 l/sec turbomolecular pump allows pump down within 10 min
  • Digital ionization gauge for high vacuum monitoring
  • Digital ammeter for the evaporation current
  • Evaporation system power: 1kVA, (75 A nominal current)
  • For evaporation data of metals, alloys and oxides click here

 

 

 

 

 

 

Optical Profiler (Zygo NewView 6000)

Important Features

  • For non-contact surface structure and thin film thickness measurements
  • Uses scanning white light interferometry to image and measure the micro structure

    and topography of surfaces in three dimensions

  • Vertical z-scan measurement range from 0.1 nm to 15000 µm
  • Optical microscope lateral resolution > 0.45 µm to 11.8 µm
  • Data scan rate of up to 85 µm/sec with 0.1 nm height resolution
  • Step height accuracies of better than 0.75%
  • Scan and display areas up to 150 mm x 150 mm

 

 

 

 

 

Mask Aligner (Karl Suss MJB-3)

Important Features

  • For contact exposure processes of wafers and substrates
  • Manual mask aligner with 0.6 µm resolution and alignment accuracy of 0.1µm
  • Wafer and substrate handling up to 4" (wafers), 4"x4" (substrates)
  • 3" diameter exposure area
  • Special substrate chucks for pieces, III-V materials, thick substrates, hybrids and HF components
  • High precision X, Y, Q alignment stage and microscope manipulator
  • 350 W mercury short-arch lamp at 365 nm and 405 nm
  • High intensity optical setups for different UV-exposure wavelengths up to 90mW/cm²

 

 

 

 

Sample Preparation

Important Features

  • Leica EM UC6 Cryo-ultramicrotome for precision ultrathin sectioning of soft and hard specimens
  • Fishione 1010 Low-angle ion mill
  • Slow-speed diamond sectioning saw and slow-speed polishing wheels
  • Parallel polishers (Fischione and Gatan) and Wedge Polisher (Ted Pella)
  • Dimple grinders (Fischione and Gatan)
  • Ultrasonic disk cutter (Fischione)
  • Optical microscopes and precision measuring tools

 

 

 

 

 

 

 

 

 

 

 

 

   
This page was last edited on August 28, 2009 2:05 PM EST. Please forward your comments and feedback to Dr. Zhorro Nikolov (znikolov@coe.drexel.edu).